Plasma in Semiconductor Manufacturing and Microfabrication

This track covers plasma applications in the fabrication of integrated circuits and MEMS devices. Topics include dry etching, passivation, photoresist stripping, and atomic layer etching. Presenters will discuss challenges in achieving high precision and selectivity at the nanoscale. Advances in low-damage plasma processes for ultra-thin substrates will be highlighted. Plasma uniformity, contamination control, and etch profile accuracy will be addressed. The role of AI and real-time diagnostics in process control will be discussed. Attendees will gain insights into how plasma is enabling the next generation of micro- and nano-electronics.

 

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