Plasma Etching

Plasma etching is a critical process used in microfabrication and semiconductor manufacturing to pattern and shape materials at a microscopic level. It involves using plasma to selectively remove material from the surface of a substrate, such as silicon wafers, to create intricate patterns and structures. The plasma contains reactive ions and radicals that chemically react with the substrate material, effectively etching away unwanted areas. Plasma etching is highly precise and allows for fine feature sizes, making it essential for creating integrated circuits and other microelectronic components. It plays a vital role in modern electronics by enabling the production of smaller and more powerful devices.

 

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