Plasma Etching

Plasma etching is a critical process used in microfabrication and semiconductor manufacturing to pattern and shape materials at a microscopic level. It involves using plasma to selectively remove material from the surface of a substrate, such as silicon wafers, to create intricate patterns and structures. The plasma contains reactive ions and radicals that chemically react with the substrate material, effectively etching away unwanted areas. Plasma etching is highly precise and allows for fine feature sizes, making it essential for creating integrated circuits and other microelectronic components. It plays a vital role in modern electronics by enabling the production of smaller and more powerful devices.

 

    Related Conference of Plasma Etching

    November 27-28, 2024

    14th World Congress on Analytical & Bioanalytical Techniques

    Amsterdam, Netherlands
    November 28-29, 2024

    20th European Organic Chemistry Congress

    Paris, France
    December 12-13, 2024

    23rd World Congress on Nutrition and Food Chemistry

    Rome, Italy
    December 18-19, 2024

    4th International Conference on Petrochemistry and Natural Gas

    Amsterdam, Netherlands
    January 27-28, 2025

    25th World Congress on Medicinal Chemistry and Drug Design

    Bangkok, Thailand
    March 13-14, 2025

    2nd International Conference on Drug Discovery and Development

    Prague, Czech Republic
    April 07-08, 2025

    15th World Congress on Chemistry

    Vancouver, Canada
    May 14-15, 2025

    17th International Conference on Clinical Chemistry

    Toronto, Canada
    June 26-27, 2025

    14th World Congress on Chromatography

    Paris, France

    Plasma Etching Conference Speakers

      Recommended Sessions

      Related Journals

      Are you interested in