Plasma Etching
Plasma etching is a critical process used in microfabrication and semiconductor manufacturing to pattern and shape materials at a microscopic level. It involves using plasma to selectively remove material from the surface of a substrate, such as silicon wafers, to create intricate patterns and structures. The plasma contains reactive ions and radicals that chemically react with the substrate material, effectively etching away unwanted areas. Plasma etching is highly precise and allows for fine feature sizes, making it essential for creating integrated circuits and other microelectronic components. It plays a vital role in modern electronics by enabling the production of smaller and more powerful devices.
Related Conference of Plasma Etching
March 13-14, 2025
2nd International Conference on Drug Discovery and Development
Prague, Czech Republic
April 07-08, 2025
17th International Conference & Expo on Chromatography Techniques
Vancouver, Canada
June 25-26, 2025
15th World Congress on Analytical & Bioanalytical Techniques
Aix-en-Provence, France
September 25-26, 2025
25th International Conference on Medicinal Chemistry and Drug Design
Zurich, Switzerland
Plasma Etching Conference Speakers
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