Plasma Chemistry and Plasma Processing

Plasma polymerization, also known as plasma-enhanced chemical vapor deposition (PECVD), is a technique used to deposit thin polymer films onto various substrates. In this process, a precursor gas containing monomers is introduced into a low-pressure plasma environment. The plasma energizes the gas, causing the monomers to undergo chemical reactions and form polymer chains. These polymer chains then condense and deposit as thin films onto the substrate surface. Plasma polymerization offers several advantages, including the ability to deposit conformal and pinhole-free films on complex geometries, as well as the capability to tailor the film properties by adjusting the plasma conditions and precursor gases. This technique finds applications in microelectronics, optics, coatings, and biomedical devices.